Home // ICQNM 2013, The Seventh International Conference on Quantum, Nano and Micro Technologies // View article
Authors:
Nicolas Guillaume
Etienne Puyoo
Martine Le Berre
David Albertini
Nicolas Baboux
Brice Gautier
Francis Calmon
Keywords: Atomic force microscope; Nano lithography; Ti/TiOx, Nano devices
Abstract:
In this paper related to the field of nano technologies, we report on nano lithography for the fabrication of oxide patterns on titanium thin film using Atomic Force Microscopy (AFM). The patterns consist of lines, dots, and surfaces. Their morphology is assessed in terms of width and height as a function of the growth conditions, e.g., for lines, bias voltage and sweep velocity, and for dots bias voltage and duration of application of the bias voltage. We show that the results present a satisfactorily reproducibility. This opens the way to further developments: nano devices among which simple and double junctions are currently in development, the final goal being the development of single electron devices (SETs).
Pages: 50 to 53
Copyright: Copyright (c) IARIA, 2013
Publication date: August 25, 2013
Published in: conference
ISSN: 2308-3530
ISBN: 978-1-61208-303-2
Location: Barcelona, Spain
Dates: from August 25, 2013 to August 31, 2013